Oxford Instruments Plasma Technology (OIPT)is pleased to announce improved end-pointing capability on its range of plasma etch and deposition tools, with the introduction of the CCD1 Spectrometer system. The CCD1 is capable of providing both a process endpointing capability, and UV/VIS spectrum capture, and is available as a standard option on all new tools or as an upgrade option for existing Oxford Instruments customers.
This spectrometer provides a cost-effective route to general purpose endpointing and spectroscopy, without compromising on resolution or signal strength.
CCD1是一个UV/VIS CCD光谱仪，可以监测200nm-880nm波长的广泛等离子体排放。该单元可以通过两种方式之一：通过OIPT的PC2000软件或全频谱查看和录制来检测过程端点。这为用户提供了详细的等离子体光谱信息，可用于监测血浆中物种的浓度。光谱也可以与以前的光谱数据进行比较 - 用于系统监测，故障检测和潜在的故障分类。
现在，在新的OIPT蚀刻和沉积工具上作为系统选项可用，CCD1光谱仪也可以作为对现场系统的升级，取决于系统年龄，类型和配置。