TheEline Plusfrom Raith is considered to be the optimum, widely distributed system for Research Centers and Universities that want to incorporate an Electron Beam Lithography system with an open platform for extra optional nanofabrication processes and methods in a single tool. A gas injection system for FEBIP processes, totally incorporated nanomanipulators for example, nanoprobing and a wide range of additional options complement the uncompromised lithography system architecture and allow the eLINE Plus to become the world’s most unique and universal nanoengineering EBL system.
Eline PlusProduct Details
主要应用程序
- Nanolithography
- Nanoengineering
- SEM imaging and analysis
- Nanomanipulation, nanoprobing, nanoprofilometry
- Focused Electron Beam Induced Processes (FEBIP)
Column Technology
- Gemini
- 电子
- 30 kV
- innense se检测器
- Energy selective BSE (EsB) detector option
Stage
- 4” full travel
- Large Z travel
- Rotation and tilt option
Unique Writing Mode
Gemini-Type电子束列，用于最广泛的纳米工程应用程序带宽。Image credit: Raith
Nanoengineering, Nanomanipulation and Focused Electron Beam Induced Processes (FEBIP)
- Wide range of nanofabrication processes
- Improved TFE electron column offering the smallest beam size in the world
- Upgradable and open platform concept
- Unique stitch-error-free writing modes, traxx and periodixx
- Multiple detector concepts for unparalleled flexibility in mark recognition, analytical and imaging applications
- RAITH纳米仪：所有模块完全集成的完整软件接口
Expandable Research Tool Concept
Eline Plus´s modularly expandable research tool concept allow users to upgrade and adapt their system to existing trends in nanoresearch even long after the system is purchased. The eLINE Plus, by spanning beyond the “classical EBL application range”, makes way for interdisciplinary activities – across several fields of research.
由EBL系统产生的最小电子束尺寸为1.6 nm，表明无可争议的先决条件，可以分析超出边界以外的最大分辨率纳米化 - 无论是在纳米光刻还是其他聚焦电子束诱导的过程（Febip）。
TwinLITH – Combining the Strengths of EBL and FIB
The perfect solution for next-generation nanofabrication is offered when a Raith electron beam lithography tool is integrated with a Raith focused ion beam system. Since theRaith systemsshare a software and hardware platform, it is possible to realize perfect synergy of 2D EBL resist accelerated lithography and 3D direct FIB patterning. The shared lithography architecture allows easy exchange of GDSII designs, job lists and sample holders, and thus permits efficient and advanced nanofabrication.
这两个独立的互补系统允许并行处理其他纳米制作任务，而不会浪费时间或损害任何一种纳米制作方法的全部好处。可以同时用两只手写作，并充分利用每种工具的图案，过程开发和控制的优势。
Eline Plus纳米光刻应用
Sub 5 nm lines in HSQ e-beam resist (Image Credits: J. Yang, D. Morecroft, M. Mondol, K. Berggren, MIT, and J. Klingfus, Raith USA)
Metallic lateral spin valves (Image Credits: F. Casanova et al., CIC nanoGUNE, San Sebastian, Spain)
Dense devices: 1 kB crosspoint RRAM (Image Credits: Sunghyun Jo, University of Michigan, USA)
Advanced EBL: Photonic crystal structure in membrane (underetched) (Image Credits: William Whelan-Curtin, University of St. Andrews, UK)
Exact neurite guidance by nanogratings (Image Credits: Laboratorio NEST Pisa, Nano Lett. 2011, 11, 505-511)
Eline PlusNanoengineering Applications
Nanoprobing of freely suspended Pt-nanowire, deposited on gold contact pads with EBID
3D nanosculpturing by electron beam induced deposition (EBID)
EBID-Deposit nanoprofilometry for growth rate determination (Raith)
Material contrast with energy selective inlens BSE-detector
