用聚焦离子束进行纳米化

A variety of direct patterning or masking techniques that complement the overall nanofabrication process are provided by focused ion beam (FIB). To reduce the efforts involved in process development and simplify the nanofabrication process, milling, direct etching or deposition can be done. In addition to standard resist lithography, other techniques like ion implantation, surface functionalization, and resistless hard masking can be used for selectively modifying a material or directing a subsequent processing step.

FIB Nanofabrication Beyond Gallium

EBL-based nanofabrication is perfectly complemented by FIB nanofabrication methods, to the extent that FIB and EBL can be integrated in a system with reproducibility, high resolution, automation, and lithography class stability. Raith’s proprietaryFIB technologycan be upgraded for stable delivery of a variety of new ion species beyond gallium, including Si and Au. These ion species can be easily selected within seconds and used for new, improved processing. Moreover, this technology can be extended to ion sources that are custom-made for application-specific capabilities, for instance, ion implantation in quantum technology.

Multi Species Alloy Source. Image credit: Raith

用氦气和霓虹灯纳米图案和成像

聚焦的氦气和霓虹灯梁为纳米图案铺平了道路，并具有互补的强度。这些离子是从气场离子源传递的，非常轻，提供了不同的材料/梁相互作用，但铣削速率较低，但横向加工效果较高。Zeiss Orion Nanofab以及Raith ELPHY MultiBeambased on a microscope platform. Nanofabrication can be further improved by using helium and neon ion beams related to mix-and-match methods that utilize EBL or FIB Nanofabrication instruments.

This information has been sourced, reviewed and adapted from materials provided by Raith.

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