The Increase of Ion Density in High Power Twin-Cathode Magnetron Systems

优化的电线处理（OWIT）项目的主要重点是开发和评估一种新的沉积方法，以实现在纤维和电线上具有出色物理特性的均匀涂层。使用点源或平面目标的标准溅射技术的主要局限性是无法将大多数溅射物种引入底物。

Researchers have now proposed a magnetron sputter system (Figure 1) operating in High Power Impulse (HIPIMS) mode that stores metal ions in significant quantities. These ions can be found at the chamber walls, and can be continuously used for the deposition process.

This helps in maintaining a high level of self-sputtering at comparatively low power inputs. This technique provides new coatings with distinct physical, chemical and electrical properties including long chemical and mechanical lifetime, high ageing quality, and good mechanical strength.

Figure 1.The experimental setup with four essentially balanced planar magnetrons (2” Ti targets), Langmuir probe, and the system of capillaries used to introduce wires from atmospheric pressure

新沉积技术的目标

The following major objectives were taken into account to evaluate the new method and deposition technique:

• 使用通过实验数据通过plasma diagnostic tools, plasma modeling可以使用粒子中的粒子（PIC）和蒙特卡洛方法进行。可以通过广泛的等离子体建模和计算来确定散装等离子体的最佳特性，包括场分布，密度，几何形状等。
  
• New technological advancements were achieved in the field of smart processing of wires. The main difficulty in this project involves concentrating high-density plasma in a small cylindrical volume with a comparatively large length.
  
  研究人员旨在在电线周围产生合适的等离子体屏蔽，以同时沉积和植入本构涂层物种。新的等离子体构型促进了高沉积率，因此较高的治疗速度。未来的工作将集中于获得完美的圆柱等离子体几何形状，以确保整个电线表面的均匀处理。
  
• Using the Hiden Analytical ESPion Advanced Langmuir Probe, plasma diagnostics were performed. The probe was inserted into the middle of the discharge volume between four essentially balanced magnetrons to analyze various power modes at the active phase of HIPIMS plasma generation.
  
  在循环由一个脉冲组成的条件下，使用计数设备将触发波形转换为单个脉冲。在每个周期开始时，在排放电压的第一个边缘水平之前诱导触发5μs。在这种情况下，探针可以提供125NS分辨率，以确定包括等离子体和浮动电位，电子温度以及离子和电子密度在内的关键等离子体参数。

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